212th ECS 2007

発表資料一覧
舘 喜一 Improvement of Interface Properties of W/La2O3/Si MOS Structure Using Al Capping Layer
足立 学 Control of Flat Band Voltage by Partial Incorporation of La2O3 or Sc2O3 into HfO2 in Metal/HfO2/SiO2/Si MOS Capacitors